Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

S Nakao, J Abe, A Nakae, A Imai… - Optical …, 2005 - spiedigitallibrary.org
A novel RET named Super Diffraction Lithography (SDL), which enables 90~ 80 nm random
line by single exposure in KrF wavelength, has been developed. A pair of bright lines, which …
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Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

S Nakao, J Abe, A Nakae, A Imai… - Optical …, 2005 - ui.adsabs.harvard.edu
A novel RET named Super Diffraction Lithography (SDL), which enables 90~ 80 nm random
line by single exposure in KrF wavelength, has been developed. A pair of bright lines, which …

Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

S Nakao, J Abe, A Nakae, A Imai, K Narimatsu - spiedigitallibrary.org
ABSTRACT A novel RET named Super Diffraction Lithography (SDL), which enables 90~ 80
nm random line by single exposure in KrF wavelength, has been developed. A pair of bright …