Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

D Kim, H Lee, D Kim, YK Kim - Journal of crystal growth, 2005 - Elsevier
The electrical resistivity and mechanical hardness of reactively sputtered tantalum nitride
(TaN) thin films on ceramic substrates have been investigated. Depending on the …
被引用次数：56 相关文章

Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

DK Kim, H Lee, D Kim, YK Kim - Journal of Crystal Growth, 2005 - pure.korea.ac.kr
The electrical resistivity and mechanical hardness of reactively sputtered tantalum nitride
(TaN) thin films on ceramic substrates have been investigated. Depending on the …

Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

D Kim, H Lee, D Kim… - Journal of Crystal Growth, 2005 - ui.adsabs.harvard.edu
The electrical resistivity and mechanical hardness of reactively sputtered tantalum nitride
(TaN) thin films on ceramic substrates have been investigated. Depending on the …

Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

D Kim, H Lee, D Kim, YK Kim - Journal of Crystal Growth, 2005 - infona.pl
The electrical resistivity and mechanical hardness of reactively sputtered tantalum nitride
(TaN) thin films on ceramic substrates have been investigated. Depending on the …

[引用][C] Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

DK KIM, H LEE, D KIM, YK KIM - Journal of crystal growth, 2005 - pascal-francis.inist.fr
Electrical and mechanical properties of tantalum nitride thin films deposited by reactive
sputtering CNRS Inist Pascal-Francis CNRS Pascal and Francis Bibliographic Databases …

[引用][C] Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering

DK KIM, H LEE, D KIM, KKIM YOUNG - Journal of crystal growth, 2005 - Elsevier