Antimony-doped tin oxide (ATO) films, approximately 320 nm in thickness, have been
prepared by electron beam evaporation onto glass substrates. The films were annealed at
temperatures between 400° C and 550° C in air and their structure and surface
morphologies were observed by X-ray diffraction (XRD) and atomic force microscopy (AFM)
after the different annealing treatments. XRD patterns of the ATO thin films as-deposited and
annealed at 400° C showed that they were amorphous, but annealing beyond 400° C …

Molybdenum disulphide (MoS 2) thin films were deposited on flexible stainless steel mesh
(SSM) using an electrodeposition method. The influence of annealing treatment from 200 to
800° C under a Nitrogen atmosphere for 30 min, on the structural, morphological, optical,
and electrical properties of samples were investigated. X-ray diffraction showed that MoS 2
thin film annealed at 700° C exhibited the best crystalline quality with (002) preferential
orientation. Scanning electron microscopy showed that the films were compact and grain …