High spin mixing conductance and spin transparency in ion-beam sputtered Ta/Co60Fe20B20 bilayers on Si (100)

S Hait, S Husain, V Barwal, L Pandey, N Sharma… - Surfaces and …, 2022 - Elsevier
Surfaces and Interfaces, 2022Elsevier
Ta/CoFeB heterostructure has been considered as a promising structure for spin torque-
based memory applications. Here, a systematic investigation of the magnetic (static and
dynamic) properties of ion-beam sputtered Ta/Co 60 Fe 20 B 20 (CFB) bilayer thin films has
been done. In the series, the thickness of CFB (t CFB) layer is varied from 2 to 24 nm,
keeping the buffer Ta layer thickness fixed at 5 nm as a spin sink reservoir. The structural
studies reveal a mixed phase (α+ β) growth of Ta layer, while CFB is amorphous, and the …
Ta/CoFeB heterostructure has been considered as a promising structure for spin torque-based memory applications. Here, a systematic investigation of the magnetic (static and dynamic) properties of ion-beam sputtered Ta/Co 60 Fe 20 B 20 (CFB) bilayer thin films has been done. In the series, the thickness of CFB (t CFB) layer is varied from 2 to 24 nm, keeping the buffer Ta layer thickness fixed at 5 nm as a spin sink reservoir. The structural studies reveal a mixed phase (α+ β) growth of Ta layer, while CFB is amorphous, and the interface between them is quite smooth with extremely low interface roughness (< 3Å). The saturation magnetization is found to be increased from 957 (±30) kA/m to 1097 (±19) kA/m with t CFB while the coercivity lies in the range of 0.18-0.75 mT, suggesting the highly soft magnetic nature of the CFB films. Ferromagnetic resonance spectroscopy was performed to study the spin pumping response of the Ta/CFB bilayer thin films. From the variation of effective magnetization with t CFB, surface anisotropy energy of the CFB film is calculated to be 0.24±0.07 erg/cm 2. From the effective damping change with t CFB, the effective spin mixing conductance (g e f f↑↓) and transparency (T) of the Ta/CFB interface are extracted and found to be 11.74±1.14 nm− 2 and 60.61±5.88%, respectively. The origin of large g e f f↑↓ and T lies at the smooth interface between Ta and CFB. Such a large values of these parameters in Ta/CFB heterostructures are essential requirements for spin device applications.
Elsevier
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