Hydrogenated amorphous silicon samples were deposited on glass substrates at different
temperatures by high frequency plasma-enhanced chemical vapor deposition. In this way,
samples with different hydrogen concentrations and structures were obtained. The transition
from an amorphous to a crystalline material, induced by a four-step thermal annealing
sequence, has been followed. Effusion of hydrogen from the films plays an important role in
the nucleation and growth mechanisms of crystalline silicon grains. Measurements of …