Optical emission spectroscopy of the active species in N₂ plasma is carried out to investigate their concentration as a function of discharge parameters such as filling pressure (2.0–7.0 mbar), source power (100–200 W) and gas flow rate (50–300 mg/min). The primary motivation of this work is to obtain reliable information about the concentration of the active species of N₂ plasma, which play an important role in plasma surface nitriding processes. Emission intensity from the selected electronic excited states of molecular and atomic species is evaluated as a function of discharge parameters to investigate their concentration. The emission intensity ratio I(N ₂ ⁺ )/I(N₂) and I(N⁺)/I(N) of the electronic transitions is also evaluated as a function of discharge parameters to investigate the relative dependence of their concentrations. It is observed that the concentration of the active species of N₂ plasma is strongly affected by the filling pressure and source power whereas flow rate has no significant effect. An increased occurrence of N ₂ ⁺ molecular ions in comparison with N₂ molecules, and N⁺ ions in comparison with N atoms is observed with source power whereas decreased occurrence of N ₂ ⁺ molecular ions in comparison with N₂ molecules, and N⁺ ions in comparison with N atoms is observed with the rise in filling pressure.