Optical properties and bipolar resistive switching of ZnO thin films deposited via DC magnetron sputtering
This work presents a study of the resistive switching behavior of ZnO thin films deposited via
DC magnetron sputtering. Thin films were deposited on soda-lime glass and Ti foils, varying
ZnO target power, between 80 W and 120 W, and substrate temperature, between 293 K
and 423 K. All samples were submitted to annealing processes in situ at 473 K for 2 h. XRD
measurements allowed identifying the ZnO wurtzite phase, while AFM micrographs showed
the surface formation characterized by small, elongated grains of approximately 80 nm wide …
DC magnetron sputtering. Thin films were deposited on soda-lime glass and Ti foils, varying
ZnO target power, between 80 W and 120 W, and substrate temperature, between 293 K
and 423 K. All samples were submitted to annealing processes in situ at 473 K for 2 h. XRD
measurements allowed identifying the ZnO wurtzite phase, while AFM micrographs showed
the surface formation characterized by small, elongated grains of approximately 80 nm wide …
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