Room temperature interactions of water vapor with HfO2 films on Si
C Driemeier, EP Gusev, IJR Baumvol - Applied physics letters, 2006 - pubs.aip.org
Hf O 2∕ Si O 2∕ Si (001) thin film structures were exposed at room temperature to water
vapor isotopically enriched in H 2 and O 18 followed by quantification and profiling of these
nuclides by nuclear reaction analysis. We showed (i) the formation of strongly bonded
hydroxyls at the Hf O 2 surface;(ii) room temperature migration of oxygen and water-derived
oxygenous species through the Hf O 2 films, indicating that Hf O 2 is a weak diffusion barrier
for these oxidizing species;(iii) hydrogenous, water-derived species attachment to the Si O 2 …
vapor isotopically enriched in H 2 and O 18 followed by quantification and profiling of these
nuclides by nuclear reaction analysis. We showed (i) the formation of strongly bonded
hydroxyls at the Hf O 2 surface;(ii) room temperature migration of oxygen and water-derived
oxygenous species through the Hf O 2 films, indicating that Hf O 2 is a weak diffusion barrier
for these oxidizing species;(iii) hydrogenous, water-derived species attachment to the Si O 2 …
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