Thin lead oxide layers (about 145 nm) were evaporated onto silica glass substrates and
were reacted at 500° C for various times. The spatial extent of the reaction layers was
determined by utilizing an ion-beam-induced radiation technique and by evaluating optical
measurements. Transmission electron microscopy in conjunction with selected area
diffraction as well as electron reflection diffraction revealed that the interdiffusion layers
resemble lead silicate glasses in their structure and crystallization behavior. Refractive index …