Publisher Summary The chapter overviews the role of ionized physical vapor decomposition
in integrated circuit fabrication. Ionized physical vapor deposition (I-PVD) is a deposition
process in which the depositing species are initially vaporized by physical mechanisms. In
addition, the flux of depositing species must be composed of> 50% ions. Two other common
deposition techniques using ions are known as ion beam-assisted deposition (IBAD) and
ion-assisted deposition (lAD). These methods cobombard a film deposited from neutral …