Topographic characterization of Cu–Ni NPs@ aC: H films by AFM and multifractal analysis
In the present work three-dimensional (3-D) surface topography of Cu–Ni nanoparticles in
hydrogenated amorphous carbon (Cu–Ni NPs@ aC: H) with constant thickness of Cu and
three thicknesses of Ni prepared by RF-Plasma Enhanced Chemical Vapor Deposition (RF-
PECVD) system were investigated. The thin films of Cu–Ni NPs@ aC: H with constant
thickness of Cu and three thicknesses of Ni deposited by radio frequency (RF)-sputtering
and RF-PECVD systems, were characterized. To determine the mass thickness and atomic …
hydrogenated amorphous carbon (Cu–Ni NPs@ aC: H) with constant thickness of Cu and
three thicknesses of Ni prepared by RF-Plasma Enhanced Chemical Vapor Deposition (RF-
PECVD) system were investigated. The thin films of Cu–Ni NPs@ aC: H with constant
thickness of Cu and three thicknesses of Ni deposited by radio frequency (RF)-sputtering
and RF-PECVD systems, were characterized. To determine the mass thickness and atomic …
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