Ultrathin and Ultrasmooth Gold Films on Monolayer MoS2
DI Yakubovsky, YV Stebunov… - Advanced Materials …, 2019 - Wiley Online Library
Advanced Materials Interfaces, 2019•Wiley Online Library
Sub‐10 nm continuous metal films are promising candidates for flexible and transparent
nanophotonics and optoelectronic applications. In this article, it is demonstrated that
monolayer MoS2 is a perspective adhesion layer for the deposition of continuous conductive
gold films with a thickness of only 3–4 nm. Optical properties of continuous ultrathin gold
films deposited on 2D MoS2 grown by chemical vapor deposition are investigated by
spectroscopic ellipsometry over a wide wavelength range (300–3300 nm). Results show that …
nanophotonics and optoelectronic applications. In this article, it is demonstrated that
monolayer MoS2 is a perspective adhesion layer for the deposition of continuous conductive
gold films with a thickness of only 3–4 nm. Optical properties of continuous ultrathin gold
films deposited on 2D MoS2 grown by chemical vapor deposition are investigated by
spectroscopic ellipsometry over a wide wavelength range (300–3300 nm). Results show that …
Abstract
Sub‐10 nm continuous metal films are promising candidates for flexible and transparent nanophotonics and optoelectronic applications. In this article, it is demonstrated that monolayer MoS2 is a perspective adhesion layer for the deposition of continuous conductive gold films with a thickness of only 3–4 nm. Optical properties of continuous ultrathin gold films deposited on 2D MoS2 grown by chemical vapor deposition are investigated by spectroscopic ellipsometry over a wide wavelength range (300–3300 nm). Results show that optical losses in ultrathin films increase with decreasing thickness due to the fine‐grained structure and the presence of a small number of voids, however, they exhibit metallic properties down to a thickness of 3–4 nm. The atomic‐scale MoS2 interfaces can be transferred to any substrate and thus open up new opportunities for the creation of metasurfaces and a new type of van der Waals heterostructures with atomically thin metal layers.
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