Complex lithographic steps and the use of toxic chemicals in these processes are in conflict with a sustainable human society. Development of new inexpensive and green resist, simple alternative procedures, and nontoxic solvents is the key to move recyclable micro/nanofabrication from laboratory level to industrial application in large scale. Herein, precise control on protein fragmentation/aggregation upon photo/electron irradiation is conceived into egg white‐based green resist for all‐water‐based photo/electron lithography at submicron resolution. This study acquires the egg white simply from chicken egg without additional complex purification steps. Photolithography and electron‐beam direct writing on spin‐coated egg white layer can generate geometrically complex micro/nanopatterns at a low irradiation dose of 3000 and 1500 µC cm⁻² for effective positive and negative pattern, respectively. With further developing the patterned resist in chemical etching system, the resist pattern can be transferred onto underlying Si/SiO₂/Au/Cu substrates with good fidelity and one egg can efficiently process five objects with 2 in. in diameter, demonstrating its practical implication in spatially definable micro/nanoprocessing of materials.