ZnS thin film and Zn/ZnS/n-Si/Au-Sb sandwich structure grown with SILAR method and defining the characteristic parameters
A Ateş, B Güzeldir, M Sağlam - Materials science in semiconductor …, 2011 - Elsevier
A Ateş, B Güzeldir, M Sağlam
Materials science in semiconductor processing, 2011•ElsevierZnS thin film has been grown on n-Si substrate for obtaining Zn/ZnS/n-Si/Au-Sb sandwich
structure by using the Successive Ionic Layer Adsorption and Reaction (SILAR) method. For
structural properties, the XRD and SEM measurements have been done and it is seen that
films exhibit polycrystalline behavior. The energy band gap value of ZnS thin film grown
glass substrate has been found as 3.77 eV from the absorption measurements. The
sandwich structure has demonstrated clearly rectifying behavior by the current–voltage (I–V) …
structure by using the Successive Ionic Layer Adsorption and Reaction (SILAR) method. For
structural properties, the XRD and SEM measurements have been done and it is seen that
films exhibit polycrystalline behavior. The energy band gap value of ZnS thin film grown
glass substrate has been found as 3.77 eV from the absorption measurements. The
sandwich structure has demonstrated clearly rectifying behavior by the current–voltage (I–V) …
ZnS thin film has been grown on n-Si substrate for obtaining Zn/ZnS/n-Si/Au-Sb sandwich structure by using the Successive Ionic Layer Adsorption and Reaction (SILAR) method. For structural properties, the XRD and SEM measurements have been done and it is seen that films exhibit polycrystalline behavior. The energy band gap value of ZnS thin film grown glass substrate has been found as 3.77eV from the absorption measurements. The sandwich structure has demonstrated clearly rectifying behavior by the current–voltage (I–V) curves at room temperature Thermal annealing effect on the structural, optical and electrical properties has been investigated. From I–V characteristics n, Φb and mean Rs values have been calculated as 2.60, 0.71eV and 3.8kΩ at room temperature respectively. For annealed films at 400°C, these values have been found as 1.68, 0.62eV and 1.5kΩ, respectively. From C–V characteristics, carrier concentration, Fermi energy and barrier height values of this structure were calculated as a function of annealing temperature.
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