Nanocrystalline silicon carbide (nc-SiC) thin films have been grown on silicon (100)
substrates by helicon wave plasma enhanced chemical vapor deposition technique and the …

Hydrogenated nanocrystalline silicon carbide (nc-SiC: H) films, which contain nanosize SiC
crystals embedded in a-SiC: H matrix were fabricated by the electron cyclotron resonance …

Nanocrystalline (nc)-SiC film has been deposited by helicon wave plasma enhanced
chemical vapor deposition technique and intense blue-white light emission is obtained …

Four-hexagonal polytype films of nanocrystalline silicon carbide (4H-nc-SiC) were deposited
by plasma enhanced chemical vapor deposition method with more than 3× 104 Wm− 2 …

Hydrogenated nanocrystalline silicon carbide (nc-SiC: H) films were deposited in an
electron cyclotron resonance chemical vapor deposition (ECR-CVD) system using silane …

Nanocrystalline cubic silicon carbide (3C–SiC) films embedded in an amorphous SiC matrix
were fabricated by the hot-filament chemical-vapor-deposition technique using methane and …

In this work we report on the deposition of hydrogenated nanocrystalline silicon carbide (nc-
SiC: H) films using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) …

Silicon quantum dots (QDs) embedded in hydrogenated amorphous Si-rich silicon carbide
(α-SiC: H) thin films were realized by plasma-enhanced chemical vapor deposition process …

Amorphous silicon carbide (a-SiC) thin films were prepared by plasma enhanced chemical
vapor deposition. The films were post-deposition annealed in a N 2-H 2 atmosphere at …

The aim of the study reported in this paper is to investigate the role of the high partial
pressure of hydrogen introduced during the growth of nanocrystalline silicon carbide thin …