Emissivity-correcting mid-infrared pyrometry for group-III nitride MOCVD temperature measurement and control
JR Creighton, WG Breiland, DD Koleske, G Thaler… - Journal of crystal …, 2008 - Elsevier
We report a pyrometer that operates at a mid-infrared wavelength range (7–8μm), where
sapphire substrates are opaque and the reactant gases are transparent. The pyrometer also …
sapphire substrates are opaque and the reactant gases are transparent. The pyrometer also …
Emissivity-correcting near-UV pyrometry for group-III nitride OMVPE
JR Creighton, DD Koleske, CC Mitchell - Journal of crystal growth, 2006 - Elsevier
We developed a pyrometer that operates near the high-temperature bandgap of GaN, thus
solving the transparency problem once a∼ 1μm thick GaN epilayer has been established …
solving the transparency problem once a∼ 1μm thick GaN epilayer has been established …
In situ metrology advances in MOCVD growth of GaN-based materials
M Belousov, B Volf, JC Ramer, EA Armour… - Journal of crystal …, 2004 - Elsevier
In situ characterization techniques are necessary tools in modern MOCVD equipment within
both the research and production environments. In this paper, we describe two recently …
both the research and production environments. In this paper, we describe two recently …
[HTML][HTML] In-situ photoluminescence measurements during MOVPE growth of GaN and InGaN MQW structures
C Prall, C Kaspari, F Brunner, K Haberland… - Journal of Crystal …, 2015 - Elsevier
In this work we report the first quasi-continuous in-situ photoluminescence study of growing
InGaN LED structures inside an industrial-grade metal-organic vapor phase epitaxy …
InGaN LED structures inside an industrial-grade metal-organic vapor phase epitaxy …
MOVPE GaN growth: determination of activation energy using in-situ reflectometry
N Kaluza, R Steins, H Hardtdegen, H Lueth - Journal of crystal growth, 2004 - Elsevier
We report on the use of in-situ optical sensors during the MOVPE of GaN for determining the
growth temperatures and the growth rates over the temperature ranges employed for …
growth temperatures and the growth rates over the temperature ranges employed for …
Growth optimization during III-nitride multiwafer MOVPE using real-time curvature, reflectance and true temperature measurements
F Brunner, V Hoffmann, A Knauer, E Steimetz… - Journal of crystal …, 2007 - Elsevier
We employed a newly developed wafer-selective curvature, reflectance and temperature
sensor (EpiCurveTT®) in an AIX2600HT Planetary Reactor®. Growth of GaN on sapphire as …
sensor (EpiCurveTT®) in an AIX2600HT Planetary Reactor®. Growth of GaN on sapphire as …
Evaluation of sapphire substrate heating behaviour using GaN band-gap thermometry
The recent development of a commercial band-gap thermometry system for wide band-gap
materials such as GaN (the k-Space Associates'“BandiTTM”) has allowed a systematic study …
materials such as GaN (the k-Space Associates'“BandiTTM”) has allowed a systematic study …
InGaN/GaN multi-quantum well and LED growth on wafer-bonded sapphire-on-polycrystalline AlN substrates by metalorganic chemical vapor deposition
T Pinnington, DD Koleske, JM Zahler, C Ladous… - Journal of crystal …, 2008 - Elsevier
We report growth of InGaN/GaN multi-quantum well (MQW) and LED structures on a novel
composite substrate designed to eliminate the coefficient of thermal expansion (CTE) …
composite substrate designed to eliminate the coefficient of thermal expansion (CTE) …
Photoluminescence study of high quality InGaN–GaN single heterojunctions
CJ Sun, JW Yang, Q Chen, BW Lim, MZ Anwar… - Applied physics …, 1996 - pubs.aip.org
In this letter we report the results of room-temperature continuous wave and pulsed
photoluminescence measurements on InGaN–GaN single heterojunctions. These InGaN …
photoluminescence measurements on InGaN–GaN single heterojunctions. These InGaN …
In situ monitoring of GaN metal-organic vapor phase epitaxy by spectroscopic ellipsometry
S Peters, T Schmidtling, T Trepk, UW Pohl… - Journal of Applied …, 2000 - pubs.aip.org
Epitaxy of high-quality GaN on sapphire requires a rather sophisticated substrate
preparation prior to the GaN epilayer growth, namely nitridation of the substrate's surface …
preparation prior to the GaN epilayer growth, namely nitridation of the substrate's surface …