Corrosion is a phenomenon that devastatingly affects innovative, industrial, and mechanical
applications, especially in the oil and gas industries. The corrosion conceivably influences …

In the chemical mechanical polishing (CMP) process of barrier layer of multilayer copper
wiring in integrated circuits, it is necessary to add appropriate corrosion inhibitor into the …

Three phenylmethanimine derivatives (Schiff bases) were designed after a theoretical
prediction of their corrosion inhibition efficiencies and a corroboration through the use of …

Post-chemical mechanical polishing (CMP) cleaning is an indispensable process to remove
organic residues and particles on the wafer surface after CMP. Benzotriazole (BTA), a …

This study investigated mild steel corrosion inhibition using four Schiff bases in a theoretical
framework. The study used statistical analysis to relate the experimental inhibitor's efficacy to …

In the process of chemical mechanical polishing (CMP) of multilayer copper wiring of
integrated circuits, benzotriazole (BTA) as corrosion inhibitors and silica particles as …

Potassium oleate (PO) is a promising inhibitor for cobalt wiring chemical mechanical
polishing (CMP) of integrated circuit (IC) to replace benzotriazole (BTA). The insoluble Co …

Cobalt (Co) is the interconnect metal of integrated circuits with the feature size of 10 nm and
below, and Co corrosion is the main problem in cobalt interconnect chemical mechanical …

This paper aims to examine the efficiency of 5-chlorobenzotriazole (5Cl-BTA) as a copper
corrosion inhibitor in acidic rain solutions with a pH value of 2.42 by the electrochemical …

Galvanic corrosion between cobalt (Co) and copper (Cu) and surface finishing in barrier
chemical mechanic polishing (CMP) are two research hotspots in 14 nm and sub integrated …