Micro‐/nanostructured mechanical metamaterials

JH Lee, JP Singer, EL Thomas - Advanced materials, 2012 - Wiley Online Library
Mechanical properties of materials have long been one of the most fundamental and studied
areas of materials science for a myriad of applications. Recently, mechanical metamaterials …

Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits

SV Sreenivasan - Microsystems & nanoengineering, 2017 - nature.com
This article discusses the transition of a form of nanoimprint lithography technology, known
as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication …

Directed block copolymer thin film self-assembly: emerging trends in nanopattern fabrication

M Luo, TH Epps III - Macromolecules, 2013 - ACS Publications
Block copolymers have garnered significant attention in the past few decades due to their
ability to self-assemble into nanoscale structures (∼ 10–100 nm), making them ideal for …

25th anniversary article: ordered polymer structures for the engineering of photons and phonons

JH Lee, CY Koh, JP Singer, SJ Jeon… - Advanced …, 2014 - Wiley Online Library
The engineering of optical and acoustic material functionalities via construction of ordered
local and global architectures on various length scales commensurate with and well below …

Hierarchical patterns of three-dimensional block-copolymer films formed by electrohydrodynamic jet printing and self-assembly

MS Onses, C Song, L Williamson, E Sutanto… - Nature …, 2013 - nature.com
Self-assembly of block-copolymers provides a route to the fabrication of small (size,< 50 nm)
and dense (pitch,< 100 nm) features with an accuracy that approaches even the demanding …

[HTML][HTML] Inorganic block copolymer lithography

A Nunns, J Gwyther, I Manners - Polymer, 2013 - Elsevier
Block copolymer lithography, a process where block copolymer self-assembly is integrated
with conventional lithographic patterning, is emerging as a promising technology for …

High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing

JG Son, KW Gotrik, CA Ross - ACS Macro Letters, 2012 - ACS Publications
A perpendicular orientation of high-aspect-ratio polystyrene-block-polydimethylsiloxane (PS-
b-PDMS) cylindrical and lamellar PDMS microdomains was achieved by solvent annealing …

Thin film block copolymer self-assembly for nanophotonics

AA Kulkarni, GS Doerk - Nanotechnology, 2022 - iopscience.iop.org
The nanophotonic engineering of light–matter interactions has profoundly changed research
behind the design and fabrication of optical materials and devices. Metasurfaces—arrays of …

Directed assembly of high molecular weight block copolymers: highly ordered line patterns of perpendicularly oriented lamellae with large periods

E Kim, H Ahn, S Park, H Lee, M Lee, S Lee, T Kim… - Acs Nano, 2013 - ACS Publications
The directed assembly of block copolymer nanostructures with large periods exceeding 100
nm remains challenging because the translational ordering of long-chained block copolymer …

Multilayer block copolymer meshes by orthogonal self-assembly

A Tavakkoli KG, SM Nicaise, KR Gadelrab… - Nature …, 2016 - nature.com
Continued scaling-down of lithographic-pattern feature sizes has brought templated self-
assembly of block copolymers (BCPs) into the forefront of nanofabrication research …