Mitigating the forbidden pitch of extreme ultraviolet lithography using mask optimization...

[PDF] researching.cn

[PDF][PDF] 衍射光学元件设计方法综述

徐嫄， 王常宇， 王涌天， 刘娟 - Acta Optica Sinica, 2023 - researching.cn
摘要衍射光学元件(DOE) 因其轻型化, 小型化和多功能化等特点, 在现代光学系统中得到了越来
越广泛的应用. 针对不同应用场景下DOE 的性能需求, 研究人员需要灵活运用DOE …
被引用次数：1 相关文章
[PDF] optica.org

DMD digital lithography optimization based on a hybrid genetic algorithm and improved exposure model

S Huang, Y Tang, B Ren, D Wu, J Pan, Z Tian… - Optics …, 2024 - opg.optica.org
An efficient method to optimize digital micromirror device (DMD) lithography was proposed
using a hybrid genetic algorithm integrated with an improved exposure model. The improved …
相关文章

DMD maskless lithography optimization based on an improved genetic algorithm

S Huang, Y Tang, B Ren, D Wu, J Pan… - Japanese Journal of …, 2024 - iopscience.iop.org
In this paper, we propose an effective method for optimizing mask design using an
enhanced genetic algorithm (GA), significantly boosting digital micromirror device (DMD) …
被引用次数：1 相关文章 所有 2 个版本

Optimization of Supply Chain Scheduling Based on Genetic Particle Swarm Optimization Algorithm

Z Ma, C Li, Z Wu, W Han, Z Ma - International Conference on Cognitive …, 2023 - Springer
In response to the optimization problem of large-scale customization supply chain
scheduling, the author introduces a supply chain scheduling optimization approach that …
相关文章 所有 2 个版本