Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

Block copolymers have attracted increasing interest due to their ability to self-organize at
nanometer scales. 1-18 When the strength of the repulsive interaction between blocks is …

This Perspective addresses the current state of block copolymer lithography and identifies
key challenges and opportunities within the field. Significant strides in experimental and …

Porous carbon materials are of interest in many applications because of their high surface
area and physicochemical properties. Conventional syntheses can only produce randomly …

Parallel processes for patterning densely packed nanometre-scale structures are critical for
many diverse areas of nanotechnology. Thin films of diblock copolymers,,,,,,,,,, can self …

Block copolymers (BCPs) have received great attention for the past 40 years but only within
the past decade have they been seriously considered for nanotechnological applications …

Recently, a new spotlight has been focused on block copolymers, thoroughly studied for
nearly half a century, because of their potential use in numerous nanotechnologies. This …

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

The nanometer-scale architectures in thin films of self-assembling block copolymers have
inspired a variety of new applications. For example, the uniformly sized and shaped …

A simple process of solvent evaporation is shown to produce highly ordered arrays of
cylindrical microdomains in block copolymers with long‐range lateral order (see Figure) …