Area-selective atomic layer deposition on chemically similar materials: achieving selectivity on oxide/oxide patterns
Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest, but the
process usually requires substrate materials with substantially different chemical properties …
process usually requires substrate materials with substantially different chemical properties …
[引用][C] Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
TL Liu, SF Bent - Chemistry of Materials, 2021 - cir.nii.ac.jp
Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity
on Oxide/Oxide Patterns | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] …
on Oxide/Oxide Patterns | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] …