Substrate processing apparatus
SW Kim, JI Lee, WK Jeong, DR Jung… - US Patent 11,993,843, 2024 - Google Patents
Provided is a cooling device capable of controlling the temperature of an upper portion of a
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
Substrate processing apparatus
SW Kim, J Lee, WK Jeong, DR Jung… - US Patent …, 2024 - freepatentsonline.com
Provided is a cooling device capable of controlling the temperature of an upper portion of a
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
Substrate processing apparatus
SW Kim, JI Lee, WK Jeong, DR Jung… - US Patent App. 16 …, 2019 - Google Patents
Provided is a cooling device capable of controlling the temperature of an upper portion of a
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
SUBSTRATE PROCESSING APPARATUS
SW Kim, JI Lee, WK Jeong… - US Patent App. 16 …, 2019 - freepatentsonline.com
Provided is a cooling device capable of controlling the temperature of an upper portion of a
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …
reactor, or more particularly, a gas supply device, for example, a shower head. The cooling …