Molecular layer deposition (MLD) is a powerful vapor phase approach for growing thin
polymer films with molecular-level thickness control. We applied the ring-opening MLD …

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane
and N-methyl-aza-2, 2, 4-trimethylsilacyclopentane by molecular layer deposition (MLD) …

In this study, molecular layer deposition (MLD) was used to deposit ultrathin films of
methylene-bridged silicon oxycarbide (SiOC) using bis (trichlorosilyl) methane and water as …

Molecular layer deposition (MLD) is used to grow hybrid organic–inorganic films based on
two or more self-limiting surface chemical reactions. A four-step ABCD sequence using N-(2 …

Carbosiloxane thin films are grown by molecular layer deposition (MLD) using 1, 2-bis
[(dimethylamino) dimethylsilyl] ethane and ozone precursors. The films exhibit a constant …

Simultaneous improvement of mechanical properties and lowering of the dielectric constant
occur when films grown from the cyclic monomer tetravinyltetramethylcyclotetrasiloxane …

In semiconductor industry, SiCOH films with low dielectric constant (relative dielectric
constant k≤ 4.0) have been widely used as inter-metal dielectric (IMD) materials in the …

Molecular layer deposition (MLD) offers molecular level control in deposition of organic and
hybrid thin films. This article describes a new type of inorganic–organic silicon-based MLD …

Carbon doped oxide dielectrics comprised of Si, C, O, and H (SiCOH) have been prepared
by plasma enhanced chemical vapor deposition (PECVD) from mixtures of …

In this work, chemical vapor deposited low-films using trimethylsilane (3MS) as the linear
precursors and tetramethylcyclotetra siloxanes (TMCTS) as the cyclic precursors are …