Methods for forming a semiconductor device and related semiconductor device structures
Methods for forming a semiconductor device and related semiconductor device structures
are provided. In some embodiments, methods may include forming an NMOS gate dielectric …
are provided. In some embodiments, methods may include forming an NMOS gate dielectric …
Method for forming a semiconductor device structure and related semiconductor device structures
(51) Int. Ci. HOIL 21/8238 (2006.01) HOIL 29/49(2006.01) HOIL 29/51(2006.01) HOIL
27/092(2006.01)(52) US CI. CPC.. HOIL 21/823842 (2013.01); HOIL 29/4966 (2013.01); …
27/092(2006.01)(52) US CI. CPC.. HOIL 21/823842 (2013.01); HOIL 29/4966 (2013.01); …
Method for forming a semiconductor device structure comprising a gate fill metal
A method for forming a semiconductor device structure is disclosure. The method may
include, depositing an NMOS gate dielectric and a PMOS gate dielectric over a semicon …
include, depositing an NMOS gate dielectric and a PMOS gate dielectric over a semicon …
Metal gate structures and methods for forming thereof
S Ganguli, SH Yu, SH Lee, HC Ha, WT Lee… - US Patent …, 2014 - Google Patents
Metal gate structures and methods for forming thereof are provided herein. In some
embodiments, a method for forming a metal gate structure on a substrate having a feature …
embodiments, a method for forming a metal gate structure on a substrate having a feature …
Methods for forming a semiconductor structure and related semiconductor structures
D Kohen, HB Profijt, A Kretzschmar - US Patent 10,923,344, 2021 - Google Patents
A method for forming a forming a semiconductor structure is disclosed. The method may
include: forming a silicon oxide layer on a surface of a substrate, depositing a silicon …
include: forming a silicon oxide layer on a surface of a substrate, depositing a silicon …
Transistor gate-channel arrangements
GW Dewey, R Rios, S Shivaraman… - US Patent App. 16 …, 2019 - Google Patents
Disclosed herein are transistor gate-channel arrangements, and related methods and
devices. For example, in some embodiments, a transistor gate-channel arrangement may …
devices. For example, in some embodiments, a transistor gate-channel arrangement may …
Methods for forming a semiconductor structure and related semiconductor structures
D Kohen, HB Profijt, A Kretzschmar - US Patent App. 17/145,499, 2021 - Google Patents
A method for forming a forming a semiconductor structure is disclosed. The method may
include: forming a silicon oxide layer on a surface of a substrate, depositing a silicon …
include: forming a silicon oxide layer on a surface of a substrate, depositing a silicon …
Methods of fabricating semiconductor device
JG Lee, KT Huang, R Tomita - US Patent App. 16/051,635, 2019 - Google Patents
Methods of fabricating a semiconductor device are pro vided. The methods may include
forming an active pattern on a substrate, forming a gate electrode traversing the active …
forming an active pattern on a substrate, forming a gate electrode traversing the active …
Semiconductor structure and device formed using selective epitaxial process
Q Xie, V Machkaoutsan, JW Maes - US Patent 10,361,201, 2019 - Google Patents
Semiconductor structures, devices, and methods of forming the structures and device are
disclosed. Exemplary struc tures include multi-gate or FinFET structures that can include …
disclosed. Exemplary struc tures include multi-gate or FinFET structures that can include …
Multiple-gate MOS transistors
HJ Li, T Schulz - US Patent 7,755,144, 2010 - Google Patents
Semiconductor devices with transistors having different gate dielectric materials and
methods of manufacture thereofare disclosed. One embodiment includes a semiconductor …
methods of manufacture thereofare disclosed. One embodiment includes a semiconductor …