Molecular layer deposition (MLD) of aluminum alkoxide polymer films was examined using
trimethlyaluminum (TMA) and glycidol (GLY) as the reactants. Glycidol is a high vapor …

Polymeric films can be grown by a sequential, self-limiting surface chemistry process known
as molecular layer deposition (MLD). The MLD reactants are typically bifunctional …

Most hybrid films grown by atomic and molecular layer deposition (ALD and MLD) at
relatively low temperatures commonly incorporate aliphatic organic bifunctional …

A hybrid organic–inorganic polymer film grown by molecular layer deposition (MLD) is
demonstrated here. Sequential exposures of trimethylaluminum [Al (CH 3) 3] and …

Thin film growth using molecular layer deposition (MLD) or atomic layer deposition (ALD) is
based on sequential, self-limiting surface reactions. In this work, MLD is used to grow a …

Nucleation and growth during Al2O3 atomic layer deposition (ALD) were explored on a
variety of polymer films at 85° C. Al2O3 ALD was performed using sequential exposures of …

There is significant growing interest in atomic layer deposition onto polymers for barrier
coatings, nanoscale templates, surface modification layers and other applications. The …

The reactions of trimethylaluminum (TMA) toward substrates during the Al2O3 atomic layer
deposition (ALD) on a variety of polymers were studied by in situ Fourier transform infrared …

Molecular layer deposition (MLD) of the hafnium alkoxide polymer known as “hafnicone”
was grown using sequential exposures of tetrakis (dimethylamido) hafnium (TDMAH) and …

As a route to the production of organic–inorganic hybrid multilayers, the growth behavior of
molecular layer deposited (MLD) alucone and atomic layer deposited (ALD) Al2O3 films on …