Block copolymers demonstrate potential for use in next-generation lithography due to their
ability to self-assemble into well-ordered periodic arrays on the 3–100 nm length scale. The …

Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

Block copolymer lithography makes use of the self-assembling properties of block
copolymers to pattern nanoscale features over large areas. Although the resulting patterns …

While block copolymer lithography has been broadly applied as a bottom-up patterning
technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel …

Block copolymer lithography, a process where block copolymer self-assembly is integrated
with conventional lithographic patterning, is emerging as a promising technology for …

Block copolymers have attracted increasing interest due to their ability to self-organize at
nanometer scales. 1-18 When the strength of the repulsive interaction between blocks is …

Block copolymer self-assembly generates patterns with periodicity in the∼ 10–100 nm
range and is increasingly recognized as a route to lithographic patterning beyond the …

Block copolymer lithography holds promise as a next-generation technique to achieve the
sub-20 nm feature sizes demanded by semiconductor roadmaps. While molecular weight …

The integration of self-assembling block copolymer materials with traditional lithographic
techniques may enable inexpensive nanoscale patterning, provided that one can achieve …

Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm
scale lithographic features. Here, we report directed self-assembly of polyhedral oligomeric …