Interaction, transformation and toxicity assessment of particles and additives used in the semiconducting industry
E Dumitrescu, DP Karunaratne, SV Babu, KN Wallace… - Chemosphere, 2018 - Elsevier
Chemical mechanical planarization (CMP) is a widely used technique for the manufacturing
of integrated circuit chips in the semiconductor industry. The process generates large …
of integrated circuit chips in the semiconductor industry. The process generates large …
Cellular Toxicity Assessment and Environmental Impact of Pre-and Post-CMP Nanoparticle Slurries
K Kosaraju, S Crawford, S Aravamudhan - ECS Transactions, 2015 - iopscience.iop.org
Nanoparticles (NPs) of silica, ceria and alumina are used as polishing slurries for Chemical
Mechanical Planarization (CMP). However, the regulations for use and toxic levels of ENPs …
Mechanical Planarization (CMP). However, the regulations for use and toxic levels of ENPs …
[图书][B] Electrochemical Analysis of Neurotransmitters in Zebrafish Embryos: In Vivo Sensing and Nanotoxicity Screening
E Dumitrescu - 2019 - search.proquest.com
To advance the understanding of physiological and pathological pathways in live
organisms, and assess the effect of the surrounding environment, there is a need to develop …
organisms, and assess the effect of the surrounding environment, there is a need to develop …
[PDF][PDF] Cytotoxicity of Engineered Nanoparticles Used in Industrial Processing
S Crawford - 2019 - libres.uncg.edu
Chemical Mechanical Planarization (CMP) is a polishing technique used in the
semiconductor industry to thin and flatten stacked layers of metal and dielectric materials in …
semiconductor industry to thin and flatten stacked layers of metal and dielectric materials in …