[HTML][HTML] The role of nonequilibrium thermo-mechanical statistics in modern technologies and industrial processes: an overview
CG Rodrigues, AAP Silva, CAB Silva… - Brazilian Journal of …, 2010 - SciELO Brasil
The nowadays notable development of all the modern technology, fundamental for the
progress and well being of world society, imposes a great deal of stress in the realm of basic …
progress and well being of world society, imposes a great deal of stress in the realm of basic …
Is it the end of the road for silicon in power conversion?
A Lidow - 2010 6th International Conference on Integrated …, 2010 - ieeexplore.ieee.org
For the past three decades, power management efficiency and cost have shown steady
improvement as innovations in power MOSFET structures, technology, and circuit topologies …
improvement as innovations in power MOSFET structures, technology, and circuit topologies …
SiNx prepassivation of AlGaN/GaN high-electron-mobility transistors using remote-mode plasma-enhanced chemical vapor deposition
Abstract The surface of AlGaN/GaN high-electron-mobility transistors (HEMTs) tends to be
easily damaged during device fabrication, especially during high-temperature annealing. In …
easily damaged during device fabrication, especially during high-temperature annealing. In …
Simulation of high electron mobility transistors
S Vitanov - 2010 - repositum.tuwien.at
This thesis discusses III-Nitride materials and material systems on which HEMTs are based.
Own Monte Carlo simulations are supplemented by an extensive study of experimental and …
Own Monte Carlo simulations are supplemented by an extensive study of experimental and …
Electron trap memory characteristics of LiNbO3 film/AlGaN/GaN heterostructure
LZ Hao, J Zhu, WB Luo, HZ Zeng, YR Li… - Applied Physics …, 2010 - pubs.aip.org
LiNbO 3 film (LNO)/AlGaN/GaN heterostructure was fabricated and its memory
characteristics were studied. The heterostructure exhibited a wide range clockwise …
characteristics were studied. The heterostructure exhibited a wide range clockwise …
First-principles study of structural, elastic, electronic and lattice dynamic properties of AsxPyN1− x− yAl quaternary alloys
B Ghebouli, MA Ghebouli, M Fatmi, T Chihi… - Journal of alloys and …, 2010 - Elsevier
Information on the energy band gaps, the lattice parameters and the lattice matching to
available substrates is a prerequisite for many practical applications. A pseudopotential …
available substrates is a prerequisite for many practical applications. A pseudopotential …
Yüksek performanslı Al (In) GaN/AIN (In) GaN heteroeklem yapıların iletim özellikleri
R Tülek - 2010 - dspace.balikesir.edu.tr
Bu çalışmada Al (In) GaN/Ga (In) N iki boyutlu elektron gaz (2DEG) heteroyapıların iletim
özellikleri, deneysel ve teorik olarak çalışıldı. Deneysel kısımda ilk olarak örnekler metal …
özellikleri, deneysel ve teorik olarak çalışıldı. Deneysel kısımda ilk olarak örnekler metal …
[PDF][PDF] Mikrostrukturierungstechniken zur Herstellung von MEMS aus Halbleitern großer Bandlücke
F Niebelschütz - 2010 - core.ac.uk
Zusammenfassung Die Erweiterung des Anwendungsspektrums Mikroelektromechanischer
Systeme (MEMS) um das Einsatzgebiet der chemischen, biologischen, gasartspezifischen …
Systeme (MEMS) um das Einsatzgebiet der chemischen, biologischen, gasartspezifischen …
Analytical modeling of drain-current characteristics of AIGaN/GaN HFETs with incorporation of the impacts of virtual-gate and transferred-electron effect
M Moradi - 2010 - spectrum.library.concordia.ca
GaN-based heterostructure field effect transistors (HFETs) have gained considerable
attention in high-power microwave applications. So far, unsurpassed current levels and high …
attention in high-power microwave applications. So far, unsurpassed current levels and high …
[图书][B] Study of aluminum nitride/gallium nitride HEMTs: MBE growth, transport properties and device issues
Y Cao - 2010 - search.proquest.com
To achieve high-speed nitride-based high electron mobility transistors (HEMTs), both lateral
and vertical scaling are required for future device fabrication. The large polarization …
and vertical scaling are required for future device fabrication. The large polarization …