The invention relates to a method of providing a structure by depositing a layer on a
substrate in a reactor. The method comprising: introducing a silicon halide precursor in the …

A method for depositing a metal chalcogenide on a substrate by cyclical deposition is
disclosed. The method may include, contacting the substrate with at least one metal …

A method of forming vertical spacers for spacer-defined multiple patterning, includes:
depositing a first conformal pattern-transfer film having a first film stress, and continuously …

A method for selectively depositing a metallic film on a substrate comprising a first dielectric
surface and a second metallic surface is disclosed. The method may include, exposing the …

Methods for forming a metallic film on a substrate by cyclical deposition are provided. In
some embodiments methods may include contacting the substrate with a first reactant …

Primary Examiner—Mohammad Choudhry (74) Attorney, Agent, or Firm—Snell & Wilmer
LLP ABSTRACT A method of reforming an insulating film deposited on a substrate having a …

A method of forming a film on a substrate by PEALD includes deposition cycles, each
including (i) feeding a precursor in a pulse to a reaction space to adsorb a precursor on a …

The invention relates to a cassette holder assembly for holding a cassette for storing at least
one semiconductor material substrate in an interior space accessible from a front end of the …

A method for etching a target layer on a substrate by a dry etching process includes at least
one etching cycle, wherein an etching cycle includes: depositing a carbon halide film using …

Methods for depositing a co-doped polysilicon film on a surface of a substrate within a
reaction chamber are provided. The method may include: heating the substrate to a …