Application of double exposure technique in plasmonic lithography
H Ding, L Liu, L Dong, Z Chen… - Novel Patterning …, 2023 - spiedigitallibrary.org
As the critical dimension (CD) of integrated circuits (ICs) becomes smaller and smaller,
traditional optical lithography has a resolution limit due to the light diffraction effect, and …
traditional optical lithography has a resolution limit due to the light diffraction effect, and …