Sequential infiltration synthesis apparatus
IJ Raaijmakers, JW Maes, W Knaepen… - US Patent …, 2023 - Google Patents
2017-02-28 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Layer forming method and apparatus
A Klaver, W Knaepen, L Jdira, G Van Der Star… - US Patent …, 2023 - Google Patents
There is provided a method and apparatus for forming a layer, by sequentially repeating a
layer deposition cycle to process a substrate disposed in a reaction chamber. The …
layer deposition cycle to process a substrate disposed in a reaction chamber. The …
Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
M Verghese, T Dunn, JK Shugrue - US Patent 11,629,406, 2023 - Google Patents
2018-03-09 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Vertical batch furnace assembly
CGM De Ridder - US Patent 11,587,814, 2023 - Google Patents
H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state
devices during manufacture or treatment thereof; Apparatus specially adapted for handling …
devices during manufacture or treatment thereof; Apparatus specially adapted for handling …
Methods of forming silicon germanium structures
R Khazaka, LPB Lima - US Patent 11,688,603, 2023 - Google Patents
Methods for forming structures that include a layer comprising silicon germanium are
disclosed. Exemplary embodiments of the disclosure provide improved methods of forming a …
disclosed. Exemplary embodiments of the disclosure provide improved methods of forming a …
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
2021-02-01 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Methods for selective deposition of doped semiconductor material
2020-10-21 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Gas flow control plate for substrate processing apparatus
JH Shin, J Kim, J Lee, J Hyunsoo - US Patent App. 29/782,977, 2023 - Google Patents
2021-08-06 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Gas distributor for substrate processing apparatus
JH Shin, J Kim, J Lee, J Hyunsoo - US Patent App. 29/782,978, 2023 - Google Patents
FIG. 1 is a top perspective view of a gas distributor for substrate processing apparatus
showing our new design; FIG. 2 is a bottom perspective view thereof; FIG. 3 is a top plan …
showing our new design; FIG. 2 is a bottom perspective view thereof; FIG. 3 is a top plan …
Laser alignment fixture for a reactor system
S Ganguli, TR Dunn, A Kimtee - US Patent 11,626,308, 2023 - Google Patents
A laser alignment fixture for a reactor system may be used to align components of the reactor
system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment …
system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment …