Fluorinated high-performance polymers: Poly (arylene ether) s and aromatic polyimides containing trifluoromethyl groups
MG Dhara, S Banerjee - Progress in Polymer Science, 2010 - Elsevier
Introduction of fluorine into polymers has been a subject of intense research as it brings
about dramatic improvements in several properties of the polymers. Polymers containing …
about dramatic improvements in several properties of the polymers. Polymers containing …
Review of polymer materials with low dielectric constant
XY Zhao, HJ Liu - Polymer International, 2010 - Wiley Online Library
One of the exciting and promising developments in material science today is the design and
synthesis of novel low‐dielectric‐constant polymer materials, which are found to have …
synthesis of novel low‐dielectric‐constant polymer materials, which are found to have …
Ultralow dielectric constant polyarylene ether nitrile foam with excellent mechanical properties
Low dielectric constant dielectrics possess a broad prospect for application in
microelectronic devices. The most efficient method for fabricating low dielectric constant …
microelectronic devices. The most efficient method for fabricating low dielectric constant …
Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer.
C Yuan, K Jin, K Li, S Diao, J Tong… - … (Deerfield Beach, Fla.), 2013 - europepmc.org
A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and
dielectric loss less than 1.2× 10 (-3) is reported here. PFN also exhibits good mechanical …
dielectric loss less than 1.2× 10 (-3) is reported here. PFN also exhibits good mechanical …
A Fluorinated Thermocrosslinkable Organosiloxane: A New Low‐k Material at High Frequency with Low Water Uptake
F Liu, X Chen, J Hou, J Sun… - Macromolecular Rapid …, 2021 - Wiley Online Library
In order to obtain low‐k material with good comprehensive properties, a trifluoromethyl‐
containing organosiloxane with thermocrosslinkable vinyl and benzocyclobutene groups is …
containing organosiloxane with thermocrosslinkable vinyl and benzocyclobutene groups is …
Decreasing the dielectric constant and water uptake by introducing hydrophobic cross-linked networks into co-polyimide films
N Song, H Yao, T Ma, T Wang, K Shi, Y Tian… - Applied Surface …, 2019 - Elsevier
The high durability of low-k value is the key parameter for the low dielectric materials
especially used under humid conditions, because the k value is very sensitive to moisture …
especially used under humid conditions, because the k value is very sensitive to moisture …
An intrinsically microporous network polymer with good dielectric properties at high frequency
Y Luo, K Jin, C He, J Wang, J Sun, F He, J Zhou… - …, 2016 - ACS Publications
An intrinsically microporous fluoropolymer has been successfully synthesized through
thermo-cross-linking of a functional monomer having a quaternary carbon center and …
thermo-cross-linking of a functional monomer having a quaternary carbon center and …
Fluorinated Benzocyclobutene-Based Low-k Polymer at High Frequency
F Liu, J Sun, Q Fang - ACS Applied Polymer Materials, 2022 - ACS Publications
Through the Heck reaction, a fluorinated monomer with cross-linkable substituted vinyl and
benzocyclobutene groups has been successfully synthesized. Treating this monomer at …
benzocyclobutene groups has been successfully synthesized. Treating this monomer at …
An effective strategy for the preparation of intrinsic low-k and ultralow-loss dielectric polysiloxanes at high frequency by introducing trifluoromethyl groups into the …
F Liu, X Chen, L Fang, J Sun, Q Fang - Polymer Chemistry, 2020 - pubs.rsc.org
Two new trifluoromethyl-containing organosiloxanes with cross-linkable styrene groups
have been facilely synthesized by the Piers–Rubinsztajn reaction. The homopolymerization …
have been facilely synthesized by the Piers–Rubinsztajn reaction. The homopolymerization …
Dual cross-linking strategy to prepare fluorine-containing poly (arylene ether nitrile) films with a low dielectric constant and ultra-low water uptake
T Cao, Y Shi, X Li, J Peng, X Liu, Y Huang - Polymer Chemistry, 2022 - pubs.rsc.org
A low k-value in a humid environment is an important parameter for low dielectric materials,
as the k-value is very sensitive to humidity. In order to obtain a low dielectric constant and …
as the k-value is very sensitive to humidity. In order to obtain a low dielectric constant and …