Contact resistance in organic field‐effect transistors: conquering the barrier

M Waldrip, OD Jurchescu… - Advanced functional …, 2020 - Wiley Online Library
Organic semiconductors have sparked interest as flexible, solution processable, and
chemically tunable electronic materials. Improvements in charge carrier mobility put organic …

Carbon nanotube transistor technology for More-Moore scaling

Q Cao - Nano Research, 2021 - Springer
Scaling of silicon field-effect transistors has fueled the exponential development of
microelectronics in the past 60 years, but is now close to its physical limits with the critical …

Flexible low-voltage high-frequency organic thin-film transistors

JW Borchert, U Zschieschang, F Letzkus, M Giorgio… - Science …, 2020 - science.org
The primary driver for the development of organic thin-film transistors (TFTs) over the past
few decades has been the prospect of electronics applications on unconventional substrates …

End-bonded contacts for carbon nanotube transistors with low, size-independent resistance

Q Cao, SJ Han, J Tersoff, AD Franklin, Y Zhu, Z Zhang… - Science, 2015 - science.org
Moving beyond the limits of silicon transistors requires both a high-performance channel
and high-quality electrical contacts. Carbon nanotubes provide high-performance channels …

Defining and overcoming the contact resistance challenge in scaled carbon nanotube transistors

AD Franklin, DB Farmer, W Haensch - ACS nano, 2014 - ACS Publications
Carbon nanotubes (CNTs) continue to show strong promise as the channel material for an
aggressively scaled, high-performance transistor technology. However, there has been …

Challenges of nickel silicidation in CMOS technologies

N Breil, C Lavoie, A Ozcan, F Baumann… - Microelectronic …, 2015 - Elsevier
In this paper, we review some of the key challenges associated with the Ni silicidation
process in the most recent CMOS technologies. The introduction of new materials (eg SiGe) …

TiSi(Ge) Contacts Formed at Low Temperature Achieving Around cm2 Contact Resistivities to p-SiGe

H Yu, M Schaekers, J Zhang, LL Wang… - … on Electron Devices, 2017 - ieeexplore.ieee.org
This paper reports ultralow contact resistivities (ρ c) achieved on highly doped p-SiGe with
two low-temperature contact formation methods. One method combines precontact …

Titanium-based ohmic contacts in advanced CMOS technology

S Mao, J Luo - Journal of Physics D: Applied Physics, 2019 - iopscience.iop.org
Since the contact resistance characterized by a specific contact resistivity (ρ c) in the
source/drain (S/D) regions is becoming a bottleneck for further improving device …

Low-resistance titanium contacts and thermally unstable nickel germanide contacts on p-type germanium

H Yu, M Schaekers, T Schram… - IEEE Electron …, 2016 - ieeexplore.ieee.org
Ti/p-Ge and NiGe/p-Ge contacts are compared on both planar-and fin-based devices. Ti/p-
Ge contacts show low contact resistance, while NiGe/p-Ge devices show short circuit …

Segregation and activation of Ga in high Ge content SiGe by UV melt laser anneal

T Tabata, J Aubin, K Huet, F Mazzamuto - Journal of Applied Physics, 2019 - pubs.aip.org
The feasibility of dopant activation surpassing the equilibrium solid solubility limit by using
an out of equilibrium melt laser annealing (MLA) process was investigated. To that end, we …