Hybrid nanoscale patterning strategies combine the registration and addressability of
conventional lithographic techniques with the chemical and physical functionality enabled …

The osmotic energy existing in fluids is recognized as a promising “blue” energy source that
can help solve the global issues of energy shortage and environmental pollution. Recently …

To meet the increasing demand for patterning smaller feature sizes, a lithography technique
is required with the ability to pattern sub-20 nm features. While top-down photolithography is …

Block copolymer self-assembly is an innovative technology capable of patterning
technologically relevant substrates with nanoscale precision for a range of applications from …

The directed self-assembly of block copolymer (BCP) offers a new route to perfect
nanolithographic patterning at sub-50 nm length scale with molecular scale precision. We …

Hierarchically assembled amphiphilic diblock copolymer micelles were exquisitely crafted
over large areas by capitalizing on two concurrent self-assembling processes at different …

Thin films of polymer mixtures made by spin-coating can phase separate in two ways: by
forming lateral domains, or by separating into distinct layers. The latter situation (self …

Following Moore's law, the transistor density and hence the computing power of integrated
circuits have scaled exponentially with time.[1] However, optical lithography technology …

Very thin film materials have emerged as a highly interesting and useful quasi 2D-state
functionality. They have given rise to numerous applications ranging from protective and …

Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the
simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4 …