Nanoimprint lithography (NIL) is an emerging high-resolution parallel patterning method,
mainly aimed towards fields in which electron-beam and high-end photolithography are …

The effects of intermolecular interaction between casting solvents and polymer chains on
molecular entanglement and dynamics in solution-cast poly (methyl methacrylate)/poly …

Electron beam lithography (EBL), size reduction lithography (SRL), and nanoimprint
lithography (NIL) have been utilized to produce platinum nanoparticles and nanowires in the …

The micro-molding technology has played an important role in fabrication of polymer micro-
patterns and development of functional devices. In such a process, suitable solvent can …

The formation of solvent‐cast, poly (methyl methacrylate)(PMMA) thin films from dilute
bromobenzene solutions was studied using an ellipsometry technique. Bromobenzene has …

Nanoimprint lithography (NIL) processes have the characteristic that a residual resist layer is
always present between the nanoimprinted features. This residual resist layer must be …

This study reports research related to different preparation methods and characterization of
polymer nanocomposites for optical applications. The Eu-ion doped Gd2O3 nanophosphor …

It is well known that one limitation of thermal nanoimprint lithography is the difficulty to
imprint simultaneously nano-and microstructures because of the resulting different residual …

A nanopillars array for the application of molecular controlling was fabricated by use of
focused ion-beam (FIB) fine milling on a substrate of silicon. The nanopillars array can …

We present the development of a reliable 4 in. lift-off process based on trilayer nanoimprint
lithography (NIL). At first, an inductively coupled plasma etching step of the imprinted resist …