The ultimate objective of “Zero-Defect Manufacturing,” as a new growth step of Industry 4.0,
is to significantly increase product yield and eventually accomplish zero-defect. For product …

Meter-scale of the large area inductively coupled plasma etchers with the capacitive power
coupling are widely applied for the mass production of OLED (organic light emitting diode) …

Vertical scaling technique faces a physical limitation in 3D NAND device fabrication, even
assuming superior etching technology. Another promising scaling technique to increase the …

To address the challenges in real-time process diagnosis within the semiconductor
manufacturing industry, this paper presents a novel machine learning approach for …

Virtual Metrology (VM) is a method for monitoring semiconductor fabrication processes that
estimates key device properties using sensor information recorded during processing. While …

The production efficiencies of organic light emitting diode (OLED) displays and
semiconductor manufacturing have been dramatically improving with the help of plasma …

This study developed Plasma Information-based Virtual Metrology (PI-VM) to predict etching
process results and analyze process phenomena. Using a dual-frequency capacitively …

This study investigated the effect of plasma charging of the dielectric materials on the
floating sheath distribution. The sheath measurements were conducted with two targets with …

Semiconductor manufacturing processing can be jeopardized due to process fluctuations,
and the degradation of equipment parts can significantly influence process variation. Timely …

For the 3D NAND memory, the higher oxide/nitride (ON) stacked dielectric is preferred to
enhance the storage capacity, and multi-layer dielectric requirements, such as thickness …