Light–matter interactions in two-dimensional layered WSe2 for gauging evolution of phonon dynamics

AS Bandyopadhyay, C Biswas… - Beilstein journal of …, 2020 - beilstein-journals.org
Phonon dynamics is explored in mechanically exfoliated two-dimensional WSe 2 using
temperature-dependent and laser-power-dependent Raman and photoluminescence (PL) …

[HTML][HTML] Alloy disorder limited mobility of InGaN two-dimensional electron gas

P Sohi, JF Carlin, N Grandjean - Applied Physics Letters, 2018 - pubs.aip.org
The mobility of an InGaN based two-dimensional electron gas is determined for an indium
content ranging from 0 to 20%. While the electron density remains constant at∼ 2.5× 10 13 …

InGaN-channel high-electron-mobility transistor with enhanced linearity and high-temperature performance

Y Zhang, T Zhang, H Zhou, Y Li, S Xu… - Applied Physics …, 2018 - iopscience.iop.org
High-performance InGaN-channel high-electron-mobility transistors (HEMTs) are fabricated
and investigated in detail. The transconductance exhibits a high stability over a wide range …

[HTML][HTML] Effects of growth temperature on the properties of InGaN channel heterostructures grown by pulsed metal organic chemical vapor deposition

Y Zhang, X Zhou, S Xu, Z Wang, Z Chen, J Zhang… - AIP Advances, 2015 - pubs.aip.org
Pulsed metal organic chemical vapor deposition (P-MOCVD) is introduced into the growth of
high quality InGaN channel heterostructures. The effects of InGaN channel growth …

Electron mobility of two-dimensional electron gas in InGaN heterostructures: Effects of alloy disorder and random dipole scatterings

T Hoshino, N Mori - Japanese Journal of Applied Physics, 2018 - iopscience.iop.org
InGaN has a smaller electron effective mass and is expected to be used as a channel
material for high-electron-mobility transistors. However, it is an alloy semiconductor with a …

Electron mobility calculation for two-dimensional electron gas in InN/GaN digital alloy channel high electron mobility transistors

T Hoshino, N Mori - Japanese Journal of Applied Physics, 2019 - iopscience.iop.org
Abstract The InN/GaN digital alloy is a superlattice-like nanostructure formed by periodically
stacking ultra-thin InN and GaN layers. In this study, we calculate the electron mobility in …

Effects of Si-doped GaN insert layer in AlGaN/GaN/GaN: Si/AlN DH-HEMT structure

D Jung, M Kim, U Choi, K Kim, O Nam - Solid-State Electronics, 2023 - Elsevier
In this study, we investigate the effects of Si-doped GaN insert layer on the structural and
electrical characteristics of AlGaN/GaN/GaN: Si/AlN double-heterostructure high-electron …

Studies on the InAlN/InGaN/InAlN/InGaN double channel heterostructures with low sheet resistance

Y Zhang, Z Wang, S Xu, D Chen, W Bao… - Applied Physics …, 2017 - pubs.aip.org
High quality InAlN/InGaN/InAlN/InGaN double channel heterostructures were proposed and
grown by metal organic chemical vapor deposition. Benefiting from the adoption of the …

Electrical and optical conductance behavior of InGaN thin films for various physical models towards optoelectronic applications

A Mantarcı - Emergent Materials, 2021 - Springer
The optical and electrical conductivity behavior of materials produced at various pressures
was investigated using many physical models. The highest electrical conductivity value of …

Investigation of changes in structural properties of polycrystalline ln0.6628Ga0.3372N thin film

A Mantarcı - Applied Physics A, 2021 - Springer
Abstract In _ 0.6628 Ga _ 0.3372 N In 0.6628 Ga 0.3372 N thin film was coated on GaN/n-Si
(100) under various powers. Optical properties, crystal structure, bonding properties …