Antireflective Self-Cleaning TiO2 Coatings for Solar Energy Harvesting Applications
Titanium (IV) oxide (TiO2, titania) is well-known for its excellent photocatalytic properties,
wide bandgap, chemical resistance, and photostability. Nanostructured TiO2 is extensively …
wide bandgap, chemical resistance, and photostability. Nanostructured TiO2 is extensively …
Oxide heterostructure resistive memory
Resistive switching devices are widely believed as a promising candidate for future memory
and logic applications. Here we show that by using multilayer oxide heterostructures the …
and logic applications. Here we show that by using multilayer oxide heterostructures the …
The pivotal role of TiO2 layer thickness in optimizing the performance of TiO2/P-Si solar cell
HI Elsaeedy, A Qasem, HA Yakout… - Journal of Alloys and …, 2021 - Elsevier
In the present framework, the TiO 2 thin film at different thicknesses (where d= 100, 120, 140,
160, 180, and 200 nm) has been successfully synthesized using the well-known thermal …
160, 180, and 200 nm) has been successfully synthesized using the well-known thermal …
Fabrication and characterization of TiO2: ZnO thin films as electron transport material in perovskite solar cell (PSC)
A Shakoor, GA Nowsherwan, W Alam, SY Bhatti… - Physica B: Condensed …, 2023 - Elsevier
In developing quicker, smaller, and more efficient optoelectronic devices, composite thin
films are becoming progressively crucial. One reason for using composite thin films is to …
films are becoming progressively crucial. One reason for using composite thin films is to …
Structural evolution of TiO2 nanocrystalline thin films by thermal annealing and swift heavy ion irradiation
The present study probes into the transition from anatase to rutile phase of TiO 2 in 100 nm
thick nanocrystalline thin films under thermal annealing and swift heavy ion (SHI) irradiation …
thick nanocrystalline thin films under thermal annealing and swift heavy ion (SHI) irradiation …
Scaling the MOSFET gate dielectric: From high-k to higher-k?
We discuss options for metal–oxide-semiconductor field-effect transistor (MOSFET) gate
stack scaling with thin titanium nitride metal gate electrodes and high-permittivity ('high-k') …
stack scaling with thin titanium nitride metal gate electrodes and high-permittivity ('high-k') …
Growth of TiO2 thin films on chemically textured Si for solar cell applications as a hole-blocking and antireflection layer
In this work, we investigate the broad-band photoabsorption of an n-TiO 2 thin film and its
hole-blocking properties when a heterostructure is grown on a chemically textured p-Si …
hole-blocking properties when a heterostructure is grown on a chemically textured p-Si …
Conduction mechanism of leakage current due to the traps in ZrO2 thin film
Y Seo, S Lee, I An, C Song… - … science and technology, 2009 - iopscience.iop.org
In this work, a metal-oxide-semiconductor capacitor with zirconium oxide (ZrO 2) gate
dielectric was fabricated by an atomic layer deposition (ALD) technique and the leakage …
dielectric was fabricated by an atomic layer deposition (ALD) technique and the leakage …
Structural and optoelectronic properties of nanostructured TiO2 thin films with annealing
About 480 nm thick titanium oxide (TiO 2) thin films have been deposited by electron beam
evaporation followed by annealing in air at 300–600° C with a step of 100° C for a period of …
evaporation followed by annealing in air at 300–600° C with a step of 100° C for a period of …
Nanostructured low crystallized titanium dioxide thin films with good photocatalytic activity
Transparent TiO2 thin films were deposited on soda lime glass at different substrate
temperatures by a simple and reproducible spray pyrolysis technique from aqueous peroxo …
temperatures by a simple and reproducible spray pyrolysis technique from aqueous peroxo …