Review on SiC MOSFETs high-voltage device reliability focusing on threshold voltage instability

K Puschkarsky, T Grasser, T Aichinger… - … on Electron Devices, 2019 - ieeexplore.ieee.org
An overview over issues and findings in SiC power MOSFET reliability is given. The focus of
this article is on threshold instabilities and the differences to Si power MOSFETs …

A two-stage model for negative bias temperature instability

T Grasser, B Kaczer, W Goes… - 2009 IEEE …, 2009 - ieeexplore.ieee.org
Based on the established properties of the most commonly observed defect in amorphous
oxides, the E'center, we suggest a coupled two-stage model to explain the negative bias …

Effect of threshold voltage hysteresis on switching characteristics of silicon carbide MOSFETs

Y Cai, H Xu, P Sun, J Ke, E Deng… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Threshold voltage () hysteresis affects the reliability of silicon carbide (SiC) MOSFETs. To
evaluate the hysteresis effect on switching characteristics, this article first investigates the …

An overview of the NBTI phenomenon in MOS devices

DE Messaoud, B Djezzar, A Zitouni - Russian Microelectronics, 2023 - Springer
Based on the vast perusal, an overview on the negative bias temperature instability (NBTI)
effect in metal oxide semiconductor (MOS) devices, from different perspectives as well as …

On-chip reliability monitors for measuring circuit degradation

J Keane, T Kim, X Wang, CH Kim - Microelectronics Reliability, 2010 - Elsevier
Front-end-of-line reliability issues such as Bias Temperature Instability (BTI), Hot Carrier
Injection (HCI), and Time Dependent Dielectric Breakdown (TDDB) have become more …

Dynamic Gate Stress-Induced Shift and Its Impact on Dynamic in GaN MIS-HEMTs

S Yang, Y Lu, H Wang, S Liu, C Liu… - IEEE Electron Device …, 2015 - ieeexplore.ieee.org
Very fast transients of shift and their impact on under dynamic AC (1 k–1 MHz) positive gate
stress in depletion-mode (D-mode) metal–insulator–semiconductor high-electron-mobility …

Recovery investigation of NBTI-induced traps in n-MOSFET devices

B Djezzar, A Benabdelmoumene, B Zatout… - Microelectronics …, 2020 - Elsevier
Conducting negative bias temperature instability (NBTI) stress/recovery experiments on n-
type metal-oxide-semiconductor-field-effect-transistors (n-MOSFETs), we have been able to …

Intelligent blind source separation technology based on OTFS modulation for LEO satellite communication

C Li, L Zhu, C Guo, T Liu, Z Zhang - China Communications, 2022 - ieeexplore.ieee.org
In LEO (Low Earth Orbit) satellite communication system, the orbit height of the satellite is
low, the transmission delay is short, the path loss is small, and the frequency multiplexing is …

Design and analysis of a delay sensor applicable to process/environmental variations and aging measurements

X Wang, M Tehranipoor, S George… - … Transactions on Very …, 2011 - ieeexplore.ieee.org
With technology scaling, the deviation between predicted path delay using simulation and
actual path delay on silicon increases due to process variation and aging. Hence, on-chip …

Resolution of disputes concerning the physical mechanism and DC/AC stress/recovery modeling of Negative Bias Temperature Instability (NBTI) in p-MOSFETs

N Parihar, U Sharma, S Mukhopadhyay… - 2017 IEEE …, 2017 - ieeexplore.ieee.org
Negative Bias Temperature Instability (NBTI) is due to interface trap generation (ΔN IT) and
trapping of holes in gate insulator traps (ΔN HT). However, the isolation methods and the …