Recently, bioelectronic devices extensively researched and developed through the
convergence of flexible biocompatible materials and electronics design that enables more …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

The demand for charge‐coupled device (CCD) imagers has surged exponentially during the
last decade owing to their exceptionally high quality and low noise imaging. However, they …

Proteins are structurally dynamic macromolecules, and it is challenging to quantify the
conformational properties of their native state in solution. Nanopores can be efficient tools to …

We present a study of double-and single-stranded DNA transport through nanopores
fabricated in ultrathin (2–7 nm thick) freestanding hafnium oxide (HfO2) membranes. The …

Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has
increased as ALD enables conformal growth on 3-dimensional structures at relatively low …

Al 2 O 3 atomic layer deposition (ALD) is a model ALD system and Al 2 O 3 ALD films are
excellent gas diffusion barrier on polymers. However, little is known about the response of Al …

The presence of excess hydrogen at the interface between a metal substrate and a
protective oxide can cause blistering,, and spallation of the scale,,,,. However, it remains …

Recent trends in thin film encapsulations (TFEs), fabricating organic/inorganic encapsulation
films are reviewed. Atomic layer deposited inorganic films have superior barrier performance …

Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …