Molecular glass resists are low molecular-weight organic photoresist materials that readily
form stable amorphous glasses above room temperature. We have created new families of …

In this chapter, we describe three-dimensional nanostructure fabrication using 30 keV Ga+
focused ion beam chemical vapor deposition (FIB-CVD) and a phenanthrene (C 14 H 10) …

An array of dots with dimensions smaller than 50 nm is of great interest in the fabrication of
quantum box lasers and nanocompact disks. Such dot patterns are generally produced by …

We explored the structural limits of unconventional electron-beam lithography by directly
writing with an electron beam into ultrathin SiO 2 films. The obtained structures were …

抄録 Derivatives of Polyhedral Oligomeric Silsesquioxanes (POSS) and Oligosaccharides
have been investigated as potential candidates for high resolution resists. POSS materials …

Novel cleaning process harmonized environmentally by using O2 plasma with a new
fluorocarbon radical source has been developed for replacing the conventional process …

Control of Young's Modulus for Carbon Nanopillars Grown by Focused Ion Beam Induced Chemical
Vapor Deposition Page 1 6A-4-98 Control of Young's Modulus for Carbon Nanopillars Grown by …

Argon ion laser was used as the induced light source and ethane (C 2 H 4) was selected as
the precursor gas, in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure …

Nanoimprint lithography (NIL) is a very useful technique by which the fabrication of various
nanostructure devices. A conventional mold is delineated by EB lithography and dry etching …

A novel etching process of a-Si and W for cleaning the CVD chamber employing ECR O/sub
2/plasma with injecting fluorocarbon radicals generated from a fluorocarbon radical source …