The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

Protective layers are essential for Si-based photocathodes to achieve long-term stability.
The conventionally used inorganic protective layers, such as TiO2, need to be free of …

Area-selective atomic layer deposition (ALD) is an approach to self-aligned, bottom-up
nanofabrication with the potential to overcome many of the challenges facing the …

The chemical approaches enabling selective atomic layer deposition (ALD) are gaining
growing interest. The selective ALD has unlocked attractive avenues for the development of …

Using both experiment and density functional theory (DFT), we study a group of small
molecule inhibitors (SMIs) and aluminum precursors to determine how the interplay between …

Molecular interactions at interfaces have a significant effect on the wetting properties of
surfaces on a macroscale. Sum frequency generation (SFG) spectroscopy, one of a few …

In recent years, area-selective deposition (ASD) processes have attracted increasing
interest in both academia and industry due to their bottom-up nature, which can simplify …

To enable area-selective atomic layer deposition (AS-ALD), self-assembled monolayers
(SAMs) have been used as the surface inhibitor to block a variety of ALD processes. The …

Monolayer and multilayer dodecanethiols (DDT) can be assembled onto a copper surface
from the vapor phase depending on the initial oxidation state of the copper. The ability of the …