An overview of critical applications of resistive random access memory
The rapid advancement of new technologies has resulted in a surge of data, while
conventional computers are nearing their computational limits. The prevalent von Neumann …
conventional computers are nearing their computational limits. The prevalent von Neumann …
Drain-engineered TFET with fully suppressed ambipolarity for high-frequency application
MRU Shaikh, SA Loan - IEEE Transactions on Electron …, 2019 - ieeexplore.ieee.org
In this paper, we propose and simulate a novel drain-engineered structure of a quadruple-
gate tunnel fieldeffect transistor (TFET). The proposed device employs a lateral dual source …
gate tunnel fieldeffect transistor (TFET). The proposed device employs a lateral dual source …
Dielectrically modulated source-engineered charge-plasma-based Schottky-FET as a label-free biosensor
SA Hafiz, M Ehteshamuddin… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
In this paper, we propose and simulate a charge-plasma (CP)-based dielectrically
modulated (DM) source-engineered Schottky barrier field-effect transistor (SE-SB-FET) as a …
modulated (DM) source-engineered Schottky barrier field-effect transistor (SE-SB-FET) as a …
2-D design of double gate Schottky tunnel MOSFET for high-performance use in analog/RF applications
In this work, a new structure of Schottky tunneling MOSFET has been designed and
simulated. The proposed device structure uses floating gates and dual material main gates …
simulated. The proposed device structure uses floating gates and dual material main gates …
Dielectrically modulated label free metal controlled organic thin film transistor for biosensing applications
In this work, a novel structure of Dielectrically Modulated Organic Thin Film Transistor
(OTFT) for biosensing applications is presented. The proposed device uses lateral metal …
(OTFT) for biosensing applications is presented. The proposed device uses lateral metal …
Plasma-based nanoarchitectonics for vertically aligned dual-metal carbon nanotube field-effect transistor (VA-DMCNFET) device: effect of plasma parameters on …
M Kansal, SC Sharma - Applied Physics A, 2022 - Springer
In this paper, we intend to show the role of plasma parameters on the performance of the
simulated device Plasma-Assisted Vertically Aligned Dual-Metal Carbon Nanotube Field …
simulated device Plasma-Assisted Vertically Aligned Dual-Metal Carbon Nanotube Field …
[图书][B] Layout techniques for MOSFETs
SP Gimenez - 2016 - books.google.com
This book aims at describing in detail the different layout techniques for remarkably boosting
the electrical performance and the ionizing radiation tolerance of planar Metal-Oxide …
the electrical performance and the ionizing radiation tolerance of planar Metal-Oxide …
Vertically Extended Drain Double Gate Si1−xGex Source Tunnel FET : Proposal & Investigation For Optimized Device Performance
This paper reports an unique approach to suppress ambipolarity and enhance drive current
in tunnel field effect transistor (TFET) by incorporating vertically extending drain in double …
in tunnel field effect transistor (TFET) by incorporating vertically extending drain in double …
Electrostatically doped DSL Schottky barrier MOSFET on SOI for low power applications
In this paper, we propose and simulate a novel Schottky barrier MOSFET (SB-MOSFET) with
improved performance in comparison to the conventional SB-MOSFET. The proposed …
improved performance in comparison to the conventional SB-MOSFET. The proposed …
Dual metal gate dielectric engineered dopant segregated Schottky barrier MOSFET with reduction in Ambipolar current
S Kale, MS Chandu - Silicon, 2022 - Springer
In this paper, to solve the problem of higher ambipolar leakage current (I ambipolar) of
Dielectric Engineered (DE) Dopant Segregated (DG) Schottky Barrier (SB) MOSFET (DE DS …
Dielectric Engineered (DE) Dopant Segregated (DG) Schottky Barrier (SB) MOSFET (DE DS …