An overview of critical applications of resistive random access memory

F Zahoor, A Nisar, UI Bature, H Abbas, F Bashir… - Nanoscale …, 2024 - pubs.rsc.org
The rapid advancement of new technologies has resulted in a surge of data, while
conventional computers are nearing their computational limits. The prevalent von Neumann …

Drain-engineered TFET with fully suppressed ambipolarity for high-frequency application

MRU Shaikh, SA Loan - IEEE Transactions on Electron …, 2019 - ieeexplore.ieee.org
In this paper, we propose and simulate a novel drain-engineered structure of a quadruple-
gate tunnel fieldeffect transistor (TFET). The proposed device employs a lateral dual source …

Dielectrically modulated source-engineered charge-plasma-based Schottky-FET as a label-free biosensor

SA Hafiz, M Ehteshamuddin… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
In this paper, we propose and simulate a charge-plasma (CP)-based dielectrically
modulated (DM) source-engineered Schottky barrier field-effect transistor (SE-SB-FET) as a …

2-D design of double gate Schottky tunnel MOSFET for high-performance use in analog/RF applications

S Rashid, F Bashir, FA Khanday, MR Beigh… - IEEE …, 2021 - ieeexplore.ieee.org
In this work, a new structure of Schottky tunneling MOSFET has been designed and
simulated. The proposed device structure uses floating gates and dual material main gates …

Dielectrically modulated label free metal controlled organic thin film transistor for biosensing applications

S Rashid, F Bashir, FA Khanday - IEEE Sensors Journal, 2021 - ieeexplore.ieee.org
In this work, a novel structure of Dielectrically Modulated Organic Thin Film Transistor
(OTFT) for biosensing applications is presented. The proposed device uses lateral metal …

Plasma-based nanoarchitectonics for vertically aligned dual-metal carbon nanotube field-effect transistor (VA-DMCNFET) device: effect of plasma parameters on …

M Kansal, SC Sharma - Applied Physics A, 2022 - Springer
In this paper, we intend to show the role of plasma parameters on the performance of the
simulated device Plasma-Assisted Vertically Aligned Dual-Metal Carbon Nanotube Field …

[图书][B] Layout techniques for MOSFETs

SP Gimenez - 2016 - books.google.com
This book aims at describing in detail the different layout techniques for remarkably boosting
the electrical performance and the ionizing radiation tolerance of planar Metal-Oxide …

Vertically Extended Drain Double Gate Si1−xGex Source Tunnel FET : Proposal & Investigation For Optimized Device Performance

A Raj, S Singh, KN Priyadarshani, R Arya… - Silicon, 2021 - Springer
This paper reports an unique approach to suppress ambipolarity and enhance drive current
in tunnel field effect transistor (TFET) by incorporating vertically extending drain in double …

Electrostatically doped DSL Schottky barrier MOSFET on SOI for low power applications

F Bashir, AG Alharbi, SA Loan - IEEE Journal of the Electron …, 2017 - ieeexplore.ieee.org
In this paper, we propose and simulate a novel Schottky barrier MOSFET (SB-MOSFET) with
improved performance in comparison to the conventional SB-MOSFET. The proposed …

Dual metal gate dielectric engineered dopant segregated Schottky barrier MOSFET with reduction in Ambipolar current

S Kale, MS Chandu - Silicon, 2022 - Springer
In this paper, to solve the problem of higher ambipolar leakage current (I ambipolar) of
Dielectric Engineered (DE) Dopant Segregated (DG) Schottky Barrier (SB) MOSFET (DE DS …