Heterogeneous wafer bonding technology and thin-film transfer technology-enabling platform for the next generation applications beyond 5G

Z Ren, J Xu, X Le, C Lee - Micromachines, 2021 - mdpi.com
Wafer bonding technology is one of the most effective methods for high-quality thin-film
transfer onto different substrates combined with ion implantation processes, laser irradiation …

Beyond Moore's law–A critical review of advancements in negative capacitance field effect transistors: A revolution in next-generation electronics

S Valasa, VR Kotha, N Vadthiya - Materials Science in Semiconductor …, 2024 - Elsevier
Conventional FETs, although serving as the backbone of modern electronics, have
encountered fundamental limits in power efficiency due to the Boltzmann limit. Negative …

Negative capacitance transistors

JC Wong, S Salahuddin - Proceedings of the IEEE, 2018 - ieeexplore.ieee.org
In recent years, the negative capacitance effect in ferroelectric (FE) materials has attracted
significant attention from many researchers around the world. The negative capacitance …

Negative differential resistance in negative capacitance FETs

J Zhou, G Han, J Li, Y Liu, Y Peng… - IEEE Electron …, 2018 - ieeexplore.ieee.org
We report the investigation of negative differential resistance (NDR) in negative capacitance
(NC) germanium (Ge) pFETs. The NDR in NC transistors is attributed to the coupling of drain …

Analysis of DIBL effect and negative resistance performance for NCFET based on a compact SPICE model

Y Liang, X Li, SK Gupta, S Datta… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
In this paper, we describe an improved SPICE model for the negative capacitance field-
effect transistor (NCFET). According to the law of conservation of charge, the model is built …

Low Voltage Operating 2D MoS2 Ferroelectric Memory Transistor with Hf1-xZrxO2 Gate Structure

S Zhang, Y Liu, J Zhou, M Ma, A Gao, B Zheng… - Nanoscale Research …, 2020 - Springer
Ferroelectric field effect transistor (FeFET) emerges as an intriguing non-volatile memory
technology due to its promising operating speed and endurance. However, flipping the …

Influence of body effect on sample-and-hold circuit design using negative capacitance FET

Y Liang, X Li, S George, S Srinivasa… - … on Electron Devices, 2018 - ieeexplore.ieee.org
Negative capacitance FET (NCFET) has become a research topic of interest in recent years
due to its interesting properties. It has the ability to retain the polarization state even in the …

Experimental validation of depolarization field produced voltage gains in negative capacitance field-effect transistors

J Zhou, G Han, N Xu, J Li, Y Peng, Y Liu… - … on Electron Devices, 2019 - ieeexplore.ieee.org
For the first time, this study experimentally validates that the depolarization field (E DE) in the
ferroelectric (FE) film leads to voltage gains in negative capacitance (NC) field-effect …

[HTML][HTML] Ferroelectric devices for intelligent computing

G Han, Y Peng, H Liu, J Zhou, Z Luo, B Chen… - Intelligent …, 2022 - spj.science.org
Recently, transistor scaling is approaching its physical limit, hindering the further
development of the computing capability. In the post-Moore era, emerging logic and storage …

Exploration and device optimization of dielectric–ferroelectric sidewall spacer in negative capacitance FinFET

V Chauhan, DP Samajdar… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Gate sidewall spacers, a pathway to the fringing fields, play a crucial role in the device
design. In this article, using well-calibrated TCAD models, we have explored the impact of a …