Wurtzite AlN films were deposited by an RF reactive sputtering technique under various
nitrogen concentrations at low temperature (350° C). The evolution of preferred orientation …

Wurtzite aluminum nitride (2H–AlN) films were deposited on (100) silicon wafers by radio
frequency (RF) magnetron reactive sputtering under various deposition conditions. The …

Wurtzite AlN (2H-AlN) films were deposited on p-type Si (100) by RF planar magnetron
reactive sputtering under various pressures at a relatively low temperature (350° C). X-Ray …

Titanium and tantalum monocarbides have been evaporated by means of doubled Nd-YAG
laser and deposited on oriented silicon substrates. The gaseous phase and the deposited …

Number densities of atoms, ions, and molecules in plasmas composed of two-element vapor-
gas mixtures have been computed assuming local thermal equilibrium. The calculations …

We report on a novel single-step method to develop steel surfaces with permanent highly
hydrophilic and anti-corrosive properties, without employing any chemical coating. It is …

The present work reports results of an extensive study of laser induced luminescence by
tripled Nd: YAG laser (λ= 355 nm) of a few most common painting materials, namely, natural …

Laser-induced fluorescence spectroscopy was employed to measure ground state number
densities of atoms and molecules in plasma plumes generated by pulsed-laser ablation of …

Time-and space-resolved emission spectroscopic measurements have been performed to
investigate the formation of molecular species in the plasma plume generated by pulsed …

Wurtzite AlN films were deposited by RF reactive sputtering technique in argon and nitrogen
gas mixtures. The evolution of preferred orientation and morphology of AlN films with the …