Annealing influence on optical performance of HfO2 thin films

SB Khan, Z Zhang, SL Lee - Journal of Alloys and Compounds, 2020 - Elsevier
Hafnium oxides (HfO 2) retain mechanical resilience, thermal stability, and chemical
resistivity due to which it is used diversely in various high-tech applications in optics and …

Microstructure, wettability, optical and electrical properties of HfO2 thin films: effect of oxygen partial pressure

J Gao, G He, B Deng, DQ Xiao, M Liu, P Jin… - Journal of Alloys and …, 2016 - Elsevier
The effect of oxygen partial pressure on the microstructure, wettability, optical and electrical
properties of sputtering-derived HfO 2 thin films has been systematically investigated by …

Highly sensitive and selective detection of dopamine using atomic layer deposited HfO2 ultra-thin films

DA Abraham, AD Li, A Sanmugam, MA Wadaan… - Electrochimica …, 2024 - Elsevier
The development of non-enzymatic and binder-free biosensors plays a vital role, and it
possesses main benefits for effective biomolecule recognition with high sensitivity and …

Structure and properties of Hf-ON films prepared by high-rate reactive HiPIMS with smoothly controlled composition

A Belosludtsev, J Houška, J Vlček, S Haviar… - Ceramics …, 2017 - Elsevier
Hafnium oxynitride ceramics were prepared in the form of thin films by high-power impulse
magnetron sputtering of Hf in various Ar+ O 2+ N 2 gas mixtures. Smooth composition …

Studies on RF magnetron sputtered HfO2 thin films for microelectronic applications

P Kondaiah, H Shaik, G Mohan Rao - Electronic Materials Letters, 2015 - Springer
We investigated the effect of oxygen flow rate during the reactive magnetron sputtering on
the compositional, structural, optical and electrical properties of HfO 2 films. We also studied …

Simultaneously-doping of HfO2 thin films by Ni with sputtering technique and effect of post annealing on structural and electrical properties

A Akkaya, O Kahveci, B Şahin, E Ayyıldız - Physica B: Condensed Matter, 2023 - Elsevier
This article reports a detailed structural and electrical characterization study of Ni: HfO 2
dielectrics grown by rf and dc sputtering and variations in the rapid thermal annealing …

Reducing optical loss of dual-ion beam sputtered HfO2 films via optimization of coating and annealing parameters

C Ma, G Chen, J He, S Fang, C Wang, Q Cai… - Optics …, 2023 - opg.optica.org
HfO_2 films are widely used for optical coatings due to the high refractive index and low
absorption, especially in the ultraviolet (UV) band. In this work, HfO_2 film samples were …

Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio

Y Wu, J Yu, L Yang, W Wu, X Wang, M Tang, B Li… - Applied Physics B, 2023 - Springer
The laser-induced damage threshold (LIDT) of optical thin films is one of the major
constraints in development of high repetition rate femtosecond laser systems. In this work …

Optimizing HiPIMS pressure for deposition of high-k (k= 18.3) amorphous HfO2

R Ganesan, BJ Murdoch, JG Partridge, S Bathgate… - Applied Surface …, 2016 - Elsevier
Stoichiometric amorphous HfO 2 films have been deposited by reactive High Power Impulse
Magnetron Sputtering (HiPIMS) from a Hf target in a 1: 1 Ar: O 2 atmosphere at pressures 2 …

Analysis of structural, optical, and aquaphobic properties of zirconium oxide nanofilms by varying sputtering gas

K Sujit, D Vikramaditya, KV Velmurugan… - … in Materials Science …, 2022 - Wiley Online Library
The problem of contamination in ceramic insulators was found to be frequent in power
transmission lines and transformers. The key aim was to develop aquaphobic zirconium …