[HTML][HTML] Status and prospects of plasma-assisted atomic layer deposition

H Knoops, T Faraz, K Arts, WMM Kessels - Journal of Vacuum Science …, 2019 - pubs.aip.org
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

Efforts of implementing ultra‐flexible thin‐film encapsulation for optoelectronic devices based on atomic layer deposition technology

G Wang, Y Duan - SmartMat, 2024 - Wiley Online Library
Flexible, wearable electronics are the future of electronics. Although organic photovoltaic
devices have the advantages of high efficiency, low cost, and flexibility, they face the …

Investigation and review of the thermal, mechanical, electrical, optical, and structural properties of atomic layer deposited high-k dielectrics: Beryllium oxide, aluminum …

JT Gaskins, PE Hopkins, DR Merrill… - ECS Journal of Solid …, 2017 - iopscience.iop.org
Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …

Foundations of atomic-level plasma processing in nanoelectronics

K Arts, S Hamaguchi, T Ito, K Karahashi… - Plasma Sources …, 2022 - iopscience.iop.org
This article discusses key elementary surface-reaction processes in state-of-the-art plasma
etching and deposition relevant to nanoelectronic device fabrication and presents a concise …

Antireflection coatings for strongly curved glass lenses by atomic layer deposition

K Pfeiffer, U Schulz, A Tünnermann, A Szeghalmi - Coatings, 2017 - mdpi.com
Antireflection (AR) coatings are indispensable in numerous optical applications and are
increasingly demanded on highly curved optical components. In this work, optical thin films …

A nanoscale inorganic coating strategy for stabilizing hydrogel neural probes in vivo

S Huang, SU Villafranca, I Mehta, O Yosfan… - Journal of Materials …, 2023 - pubs.rsc.org
Hydrogels with adaptable optical and mechanical characteristics show considerable
promise for light delivery in vivo with neuroengineering applications. However, the unlinked …

Remarkably stable high mobility self-aligned oxide TFT by investigating the effect of oxygen plasma time during PEALD of SiO2 gate insulator

SI Cho, JB Ko, SH Lee, J Kim, SHK Park - Journal of Alloys and …, 2022 - Elsevier
Oxide thin-film transistors (TFTs) should be manufactured with high mobility and stability
based on a self-aligned top-gate structure to drive high-end displays. In this study, the effect …

Comparative study of ALD SiO2 thin films for optical applications

K Pfeiffer, S Shestaeva, A Bingel, P Munzert… - Optical Materials …, 2016 - opg.optica.org
We have investigated the suitability of atomic layer deposition (ALD) for SiO_2 optical
coatings and applied it to broadband antireflective multilayers in combination with HfO_2 as …

High-efficiency UV/optical/NIR detectors for large aperture telescopes and UV explorer missions: development of and field observations with delta-doped arrays

S Nikzad, AD Jewell, ME Hoenk… - Journal of …, 2017 - spiedigitallibrary.org
Exciting concepts are under development for flagship, probe class, explorer class, and
suborbital class NASA missions in the ultraviolet/optical spectral range. These missions will …

Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design

Y Zhang, Y Ding, PD Christofides - Chemical Engineering Research and …, 2019 - Elsevier
This work develops a first-principles-based three-dimensional, multiscale computational
fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO 2 thin-film …