Deep learning-assisted magnetized inductively coupled plasma discharge modeling
Y Zhao, W Chen, Z Miao, P Yang… - Plasma Sources Science …, 2024 - iopscience.iop.org
In recent years, magnetized inductively coupled plasma (MICP) has been proposed as an
improved version of inductively coupled plasma to meet the increasing production process …
improved version of inductively coupled plasma to meet the increasing production process …
The characteristics of high etch rate ion beam etcher with magnetized inductively coupled plasma source
JW Kim, HW Cheong, YT Hong… - … Sources Science and …, 2017 - iopscience.iop.org
In this paper, newly designed magnetized inductively coupled plasma ion beam etcher (M-
ICP IBE) is proposed. Plasma density and electron temperature were measured with respect …
ICP IBE) is proposed. Plasma density and electron temperature were measured with respect …
Generic Model of Radio-Frequency Inductively Coupled Plasma (Rf-Icp) Based on Magnetic Coupled Circuit and Magnetic Pole Enhanced Broad Beam Ion Source …
G Zhou, F Shi, Y Tian, D Qiao, B Gong… - Available at SSRN … - papers.ssrn.com
The utilization of RF ICP has demonstrated significant impact in the realm of the next
generation of manufacturing technologyes. However, the traditional transformer model need …
generation of manufacturing technologyes. However, the traditional transformer model need …
자화유도결합플라즈마를이용한이온빔식각장치설계및MTJ layer 물질들의식각특성에관한연구
김지원 - 2017 - s-space.snu.ac.kr
최근에 전자 산업이 발달함에 따라 전자 기기들 막대한 정보를 처리할 뿐만 아니라 저장하는
기능이 요구되고 있다. 이러한 추세에 따라서 앞으로 사용될 메모리는 빠른 스피드와 대용량 …
기능이 요구되고 있다. 이러한 추세에 따라서 앞으로 사용될 메모리는 빠른 스피드와 대용량 …