High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

The effect of the high pulse current and the duty cycle on the deposition rate in high power
pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same …

Ionized physical vapor deposition processes are of great interest for surface modification
because the flexibility of the thin film deposition process can be increased by ionizing the …

High power pulsed magnetron sputtering (HPPMS) is used to deposit CrN films without
external heating at different peak target currents, while the average current is kept constant …

In this study, the effect on thin film growth due to an anomalous electron transport, found in
high power impulse magnetron sputtering (HiPIMS), has been investigated for the case of a …

An electron-emitting probe has been used to measure the temporal evolution of the plasma
potential V p along a line from target (Ti) to substrate above the racetrack in a high-power …