Provided is a digital exposure device. The digital exposure device includes a stage mounted
with a substrate on which a pattern is formed, a first light source, a first head, and a digital …

A measuring device (233) for monitoring movement of a first object relative to a second
object, the first object or the second object including a target surface (13), comprises a first …

The present invention relates to a method of fabricating a display device using a maskless
exposure apparatus, and the display device, and more particularly, to a method of fabri …

Embodiments of the present disclosure generally provide improved photolithography
systems and methods using a digital micromirror device (DMD). The DMD comprises …

(57) ABSTRACT A maskless exposure device includes an exposure head including a digital
micro-mirror device. The digital micro mirror device is configured to transmit a source beam …

Method of exposing a substrate by a patterned radiation beam, comprising:—providing a
radiation beam;—imparting the radiation beam by an array of individually controllable …

(57) ABSTRACT A spliced display panel includes: a spliced substrate having first openings,
spliced screen units disposed on a side of the spliced substrate, electronic devices disposed …

A maskless exposure apparatus includes a light source, an optical head including a light
modulator and an optical system, and reflecting light from the light source to radiate the light …

Embodiments of the present disclosure generally provide improved photolithography
systems and methods using a digital micromirror device (DMD). The DMD comprises …

Embodiments of the present disclosure generally provide improved photolithography
systems and methods using a digital micromirror device (DMD). The DMD comprises …